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Overlay alignment is a concern for nanolithography applications, in particular, for those using step and repeat techniques targeting next-generation lithographic applications. In this context, a new method and a proof of concept (POC) setup for accurately aligning a mask with a semiconductor wafer is presented. Utilizing active scanning probe technology, the method is employable for various lithographic...
Overlay alignment is a key technology in multi-layer Roll-to-Roll inkjet Printing. To eliminate or reduce the defects, an active compensation compliant mechanism is proposed to compensate the errors occurred during production. The mechanism consists of four parts which provide the printhead 5 DOFs to compensate errors actively. In this paper, the design of the whole device is presented. The kinematics...
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